High-productivity atomic layer deposition (ALD) processes are being driven by semiconductor applications (e.g., capacitor, gate and interconnects) requiring ultra-thin films or conformal coatings with precise thickness control. ALD is particularly effective on surfaces with high aspect ratios or where graded compositions (i.e., one layer consists of one material and the next layer of another) are required.
Noisy base line, inconsistent results, shortened column life and ghost peaks. Every day, chromatographers face these frustrating problems that not only cost money, but also tie up equipment and hamper productivity. An easy target for the blame? The carrier gas.
The next time you are enjoying a cold beer at your favorite watering hole, you might want to think about the role gas and technology play in producing its foamy flavor, texture and appeal.
As usual, SEMICON West was a winner. With more than 200 gas-related vendors, it was a bonanza for G&I. The Gases & Instrumentation (G&I) Premiere Issue presented at SEMICON West 2007 in San Francisco was a resounding success.
